Cure for PI/BCB

Temp.: ≤250℃ 或 350℃

Oxygen Concentration: 1~9999PPM or 1%~30%

Temp. Uniformity：±2.5%

Applicable Model:

Low Humidity & Q2 Baking Oven TADHE-NO/N Serie

Cleaning O2 Monitoring Oven -DF Series

Class 100 O2 Monitoring Oven -COH Series

1

Low Humidity & Anti-oxidation Baking

Temp.: ≤250℃

Oxygen Concentration: 1%~30%

Humidity：≤5%RH

Recovery Time：≤15分钟

Temp. Uniformity：±2.5%

Anti-oxidation Storage

Oxygen Concentration: 1%~10%

Humdity：≤ 5%RH

Antistatic：Antistatic materials for body and shelves with 10⁶~10⁹Ω

Applicable Model:

O2 Monitoring Nitrogen Cabinet -NDH Series

Cleaning Nitrogen Cabinet -CNDH Series

Self-Contained Nitrogen Cabinet -ANDH Series